Zygo / Technical Instrument AMS / KMS Family of Mask Metrology Systems
Features
- Automatic Measurement
- Automatic Focus and Illumination Control
- Transmitted or Brightfield Reflected Illumination Modes
- Automated Alignment Routine
- Planarization of Mask Top Surface
- Multi-Point Calibration Algorithm
Description
AMS Mask Metrology Systems:
The Zygo / Technical Instrument AMS Metrology Systems are designed specifically for the inspection and measurement of incoming photomasks, magnetic heads and wafers. They can be configured to provide the proper magnification range and working distance even for pelliclized masks. Superior resolution, repeatability and linearity make AMS Metrology Systems ideal for measuring critical X-Y axis dimensions and in verifying quality standards.
KMS Advanced Metrology Systems:
The Zygo / Technical Instrument KMS Metrology Systems help semiconductor manufacturers meet the most stringent process control demands. No other metrology system measure photomask structures at develop, etch and pelliclized process steps. For OPC, PSM and binary masks, KMS Systems provide superior resolution, repeatability and linearity. These capabilities and the modularity of the KMS Group can provide solutions for other CD-intensive applications such as flat panels, magnetic heads and wafer quality control. By combining dimensional metrology with through-focus 3D confocal imaging, KMS Metrology Systems set new standards for accuracy, repeatability and high throughput.
Product Family: AMS, KMS
Important Notice: Please note that any additional items included with this equipment such as accessories, manuals, cables, calibration data, software, etc. are specifically listed in the above stock item description and/or displayed in the photos of the equipment. Please contact one of our Customer Support Specialists if you have any questions about what is included with this equipment or if you require any additional information.