SC 1600 Marteq Superclean Rinser Dryer

Verteq rinser dryers provide several advantages over alternate drying methods. The tools are relatively simple, making them easy to operate and easy to service. Their compact size uses less floor or bench space than other systems, and they easily integrate into a wide variety of manual and automated production environments.

The SuperClean is a drying system that uses centrifugal force to dry the surface of substrates such as wafers, masks, or disks. Substrates are placed inside a drying chamber, held in place by a rotor, and spun at an appropriate speed depending on the nature of the load and process. The drying chamber, or bowl, is warmed with a continuous flow of hot filtered nitrogen and surface heaters on the outside walls. The liquid on the substrate surface is spun off and drained from the bowl while liquid droplets on the drying chamber surfaces are evaporated.

The system may also be used to pre-rinse the load prior to the drying cycle with ultra-pure DI water. The water is sprayed from a line of nozzles to provide even rinsing of the substrate surfaces. This may be done to rinse residual chemistries from the surface, or to replace existing water with fresh water prior to drying. When the dryer is used for dry-only processing, the rinse cycle may also be used for periodic cleaning of the bowl surfaces between loads.